- Various configurations have been employed for
chemical vapor deposition. We'll consider some of the reactor designs
commonly encountered in semiconductor fabrication and related fields:
- horizontal or vertical tube reactors
- showerhead
- high-density plasma
- linear injector
- Each design employs different methods for performing
the fundamental operations common to all CVD reactors: dispensing
gases, controlling temperature, introducing a plasma if desired, and
removing byproducts.
- For each design, we'll perform a simplified
transport analysis to get some idea of how
gases move around in the system, what regimes the system operates in,
and what parameters are likely to be important in determining film
deposition rate and uniformity.
- We'll also discuss various practical aspects of
making the reactors work: how to hold wafers or substrates in place,
how to control their temperature, what is easy and hard to do with
each reactor configuration.
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