
| TimeDomain CVD, Inc | Bibliography: Thermal Plasmas |
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Thermal Plasmas [volume 1], M. Boulos, P. Fauchais and E. Pfender, Plenum 1994, ISBN 0-306-44607
H.U.Eckert, Appl. Phys., 43, (1972), 2707
P.Buchner et al, Plasma Sources Sci. Tech., 6, (1997), 450
V.M. Goldfarb et al, Teplofiz, Vysoc. Temp. (Russian), 5(4), (1967)
M.I.Bouls, et al, C.J.Ch.E., 58, (1980), 367
V.S.Klubnikin (Strawberry) et al, Teplofiz, Vysoc. Temp. (Russian), 13, (1975), 473
A.V.Donskoi, V.M.Goldfarb, V.S.Klubnikin, "Physics and Technology of
low-temperature plasma " (Russian), 1972
P.Singer, Semiconductor International, Aug., 1996, 83
K.Inomata et al, Appl. Phys. Lett., 66(17), (1995), 2188
M.C.M van de Sanden et al, 44th AVS Symp. , abstracts (1997), 73
G.Pavlov et al, Appl.Phys A, 63, (1996), 9
O.Siniaguine, 1st Plasma Process-Induced Damage symposium, (1996), 151
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